Gas Field Ion Imaging and Nanofabrication – a Reference List
Gas field ion beam microscopy has been in use since 2007 for applications which require damage free imaging of nanometer features or more recently for nanofabrication of sub-10 nm structures. ZEISS ORION NanoFab is the only helium and neon focused ion beam system in the world. There are over 400 publications for applications including biological materials, nanomaterials, semiconductor structures, such as direct write lithography, nanopore milling, graphene imaging and structuring, high temperature superconductor fabrication, plasmonic device structuring, and circuit editing and analysis.
The figure shows a schematic of a gas field ion source ‘trimer’ and the electrostatic optics which create a focused helium or neon gas field ion beam. The column is coupled with a high vacuum system into which samples are inserted. Advantages include low damage imaging, surface structure detail, sub-10 nm milling, and the ability to produce ultra-high resolution images of non conductive surfaces.
A new Application Note details the published research using ZEISS ORION NanoFab over the past years. This reference list shows the vast opportunities of a multi-purpose Helium ion microscope within different areas of research. These include scientific publications in biology, nanomaterials, semiconductors, nanopatterning, instrument science, nanoplasmonics, and graphene research.
- Postek, Michael T., Andras E. Vladar, and Bin Ming. “Recent Progress in Understanding the Imaging and Metrology Using the Helium Ion Microscope.” In SPIE Scanning Microscopy, 737808–737808. International Society for Optics and Photonics, 2009.
- Economou, Nicholas P., John A. Notte, and William B. Thompson. “The History and Development of the Helium Ion Microscope.” Scanning 34, no. 2 (2012): 83 – 89.
- Joy, David C. Helium Ion Microscopy: Principles and Applications. Springer, 2013.
- Joy, David C. “Microscopy with Ions: A Brief History.” In Helium Ion Microscopy, 5 – 8. Springer, 2013.
- Joy, David C. “Operating the Helium Ion Microscope.” In Helium Ion Microscopy, 9 – 15. Springer, 2013.
- Hwlawacek, G. Vasilisa Veligura, Raoul van Gastel and Bene Poelsema. “Helium Ion Microscopy.” JVST B 32, (2014)